Thin Film Deposition, Materials Science, Solid State Physics, Material Characterization, Surface Engineering, Ion Implantation, Vacuum Technology, X-ray Diffraction, Magnetron Sputtering, Reactive Sputtering, Chemical Vapor Deposition, Physical Vapor Deposition, Thin Film Technology, Photocatalyst, Transparent Conductive Oxide, Oxide Semiconductor, Thermal properties of Thin Films, Thermal Switches

Yuzo Shigesato has been working on the physical vapor deposition of inorganic functional films with various performances, such as transparent conductive oxides (TCOs), oxide semiconductors (OSs), electro- and thermochromic, photocatalytic and optical films, based on reactive sputtering processes using alloy targets, which should be considered as one of the most promising techniques for achieving very high deposition rates for various industrial applications. In order to achieve precisely controlled depositions, specially designed feedback systems for monitoring the discharge impedance or plasma emission intensity, combined with medium frequency pulsing, have been employed. In particular, very high rate deposition of various TCOs, OSs and other functional oxide or nitride films has been studied in detail. The electrical, optical, thermal and related properties are carefully studied as a basic scientific study and for various industrial applications. In particular, the recent study of the thermal properties of switchable mirror films has been investigated using the TDTR method, which is expected to enable thermal switches that can make energy more efficient.

Various functional oxide films with high performances deposited by reactive sputtering